Vibration
As NT research advances, the increasing miniaturization of such items as microchips, processors, and devices demands the use of high performance microscopes (HPM,) and other precise instruments. To employ these microscopes and instruments, the processes involved often require a stable platform with acceptable level of vibration.
As the processes conducted in high-tech R&D&M, the vibration may be induced by earthquake, airflow, sound, traffic, near-by walking and door closing, electromagnetic interference (EMI), radio frequency (RF), or light quantum effect. When facilities grow more complex and miniaturized, vibration has become increasingly more important than the years when the demand for higher precision tools grows. (Bayat and Gordon 1998)
As far as the microelectronics industry is concerned, whereby microprocessors and semiconductor technology is produced, many tools are very sensitive to vibration. Meanwhile, sound wave becomes a growing concern since noise and floor vibration particularly affects in-process experimentation and nano-fabrication. For example, processes involving electron beams or probes, where the goal is to develop precise images of the surface, require a stable environment for relative positioning of the beam or probe, as well as for the object being scanned. Otherwise, the scanned image may appear to be in various locations at once and may be overlooked. “Both vibration and excessive thermal variation can interfere with the stability of these processes.” (Amick et al. 2002)
As the processes conducted in high-tech R&D&M, the vibration may be induced by earthquake, airflow, sound, traffic, near-by walking and door closing, electromagnetic interference (EMI), radio frequency (RF), or light quantum effect. When facilities grow more complex and miniaturized, vibration has become increasingly more important than the years when the demand for higher precision tools grows. (Bayat and Gordon 1998)
As far as the microelectronics industry is concerned, whereby microprocessors and semiconductor technology is produced, many tools are very sensitive to vibration. Meanwhile, sound wave becomes a growing concern since noise and floor vibration particularly affects in-process experimentation and nano-fabrication. For example, processes involving electron beams or probes, where the goal is to develop precise images of the surface, require a stable environment for relative positioning of the beam or probe, as well as for the object being scanned. Otherwise, the scanned image may appear to be in various locations at once and may be overlooked. “Both vibration and excessive thermal variation can interfere with the stability of these processes.” (Amick et al. 2002)
奈米科技的研發製造，微晶片、微處理器和精密儀器設備等等的微型化精密度要求逐漸提高，極須使用高性能顯微鏡（HPM）以及其他高精確度儀器。為了善用此類顯微鏡和儀器，其使用過程通常需要一個可接受震動水準的穩定平台。
因為在高科技的研究、發展與製造過程中，震動可能源於地震、氣流、噪音、交通、關門、電磁波干擾（EMI）、射頻（RF）或其他光量子波動效應。在製造設備更為複雜且更要求微型化更精密時，震動影響之重要性在奈米科技之發展時程上已逐漸超越過去對製造設備精密度的要求（Bayat and Gordon 1998）。
就微電子技術工業而言，微處理器和半導體科技的生產過程，很多工具對振動是非常敏感的。同時，因為噪音和地板振動格外影響進行中的實驗和奈米製造過程，故聲波成為日益關心的議題。例如，利用電子束或電子探查發展物體表面精確影像過程，需要穩定的環境以利電子束或探針以及被掃描物體的定位。否則，被掃描的圖像可能模糊不清同時出現在不同的位置並且可能被錯誤判讀。振動和過度的溫度變化二者皆能干擾這些過程的穩定。(Amick et al.2002.)
因為在高科技的研究、發展與製造過程中，震動可能源於地震、氣流、噪音、交通、關門、電磁波干擾（EMI）、射頻（RF）或其他光量子波動效應。在製造設備更為複雜且更要求微型化更精密時，震動影響之重要性在奈米科技之發展時程上已逐漸超越過去對製造設備精密度的要求（Bayat and Gordon 1998）。
就微電子技術工業而言，微處理器和半導體科技的生產過程，很多工具對振動是非常敏感的。同時，因為噪音和地板振動格外影響進行中的實驗和奈米製造過程，故聲波成為日益關心的議題。例如，利用電子束或電子探查發展物體表面精確影像過程，需要穩定的環境以利電子束或探針以及被掃描物體的定位。否則，被掃描的圖像可能模糊不清同時出現在不同的位置並且可能被錯誤判讀。振動和過度的溫度變化二者皆能干擾這些過程的穩定。(Amick et al.2002.)
- 調查與分析廠房設施振動傳遞狀況
- 選擇隔振參數與合適的隔振系統
- 如有不足，加上單軸減振器降低單一機器主要振動頻率之振幅，其次組合單軸減振系統或採用多軸減振系統，降低 多設施組合振動或單設施多模態振動，最後考慮浮動減振 平台。
