計畫名稱 : 開發高科技廠房設施之主動式磁場消除系統
摘要:
極低頻磁場對於晶圓廠製程之良率有不良的影響，當製程愈先進，極低頻磁場對製程與檢測設備之影響更為嚴 重，因此晶圓廠針對易受極低頻磁場影響之設備，如電子顯微鏡 SEMs、TEMs、STEMs、FIB writers、E-beam writers 相關設備，強烈要求須在磁場強度低於 0.5 毫高斯的環境下運作。因此需透過主動或被動式磁場消除的方式，使環境磁場能低於 0.5 毫高斯以下。所以，本研究計畫將著重於多頻段主動消磁系統研究。其中包含磁場感測器、功率放大器以及線圈配置等關鍵技術發展。
摘要:
極低頻磁場對於晶圓廠製程之良率有不良的影響，當製程愈先進，極低頻磁場對製程與檢測設備之影響更為嚴 重，因此晶圓廠針對易受極低頻磁場影響之設備，如電子顯微鏡 SEMs、TEMs、STEMs、FIB writers、E-beam writers 相關設備，強烈要求須在磁場強度低於 0.5 毫高斯的環境下運作。因此需透過主動或被動式磁場消除的方式，使環境磁場能低於 0.5 毫高斯以下。所以，本研究計畫將著重於多頻段主動消磁系統研究。其中包含磁場感測器、功率放大器以及線圈配置等關鍵技術發展。
Project : To Develop Active Magnetic Canceling System for High-Tech Facility
Abstrac:
The extremely low frequency (ELF) magnetic field has significant impact on yield rate especially when the processing reaches less than 14 nanometer in next- generation nano-Fab. For sensitive equipment such as the SEMs, TEMs, STEMs, FIB writers, and E-beam writers, it suggests that the ELF magnetic field should be lower than 0.5 milli-Gauss to guarantee good yield. Therefore, mitigating the magnetic field by active/passive approaches such as the material shielding, wire permutation, and active canceling are highly demanded.
Abstrac:
The extremely low frequency (ELF) magnetic field has significant impact on yield rate especially when the processing reaches less than 14 nanometer in next- generation nano-Fab. For sensitive equipment such as the SEMs, TEMs, STEMs, FIB writers, and E-beam writers, it suggests that the ELF magnetic field should be lower than 0.5 milli-Gauss to guarantee good yield. Therefore, mitigating the magnetic field by active/passive approaches such as the material shielding, wire permutation, and active canceling are highly demanded.